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High Purity Phosphoric Acid for Advanced Microelectronics Manufacturing
Phosphoric acid electronic grade is meticulously produced through chemical reactions involving elemental phosphorus or phosphorus oxide, or via advanced purification of finished phosphoric acid. The manufacturing process is precisely controlled to ensure the required content and granular purity of alkali metal and heavy metal impurity ions, meeting the stringent demands of the microelectronics industry.
Target Industries & Applications: Widely used in ultra-large scale integrated circuits, thin-film liquid crystal displays, and other microelectronics industries for critical chip wet cleaning and wet etching processes.
| Items | Units | E1 (LCD Grade) | E2 (IC Grade) |
|---|---|---|---|
| H3PO4 | % | 85-87 | 85-87 |
| H3PO3 | % | ≤0.005 | ≤0.001 |
| NO3 | mg/kg | ≤5 | ≤0.5 |
| SO4 | mg/kg | ≤10 | ≤5 |
| Cl | mg/kg | ≤1 | ≤0.5 |
| Al | µg/kg | ≤200 | ≤50 |
| B | µg/kg | ----- | ≤50 |
| Sb | µg/kg | ≤3000 | ≤300 |
| As | µg/kg | ≤100 | ≤20 |
| Ba | µg/kg | ≤100 | ≤20 |
| Cd | µg/kg | ≤100 | ≤20 |
| Ca | µg/kg | ≤1000 | ≤50 |
| Cr | µg/kg | ≤100 | ≤20 |
| Co | µg/kg | ≤100 | ≤20 |
| Cu | µg/kg | ≤50 | ≤20 |
| Ga | µg/kg | ≤100 | ≤10 |
| Au | µg/kg | ≤100 | ≤10 |
| Fe | µg/kg | ≤300 | ≤50 |
| Pb | µg/kg | ≤100 | ≤20 |
| Li | µg/kg | ≤100 | ≤10 |
| Mg | µg/kg | ≤100 | ≤20 |
| Mn | µg/kg | ≤100 | ≤20 |
| Ni | µg/kg | ≤100 | ≤20 |
| K | µg/kg | ≤100 | ≤20 |
| Ag | µg/kg | ≤100 | ≤20 |
| Na | µg/kg | ≤500 | ≤50 |
| Sn | µg/kg | ------ | ≤10 |
| Sr | µg/kg | ≤100 | ≤20 |
| Ti | µg/kg | ≤100 | ≤50 |
| Zn | µg/kg | ≤100 | ≤50 |
| Granule | µm,pcs/ml | ------ | ----- |
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